*========================================================================* | I O N | *------------------------------------------------------------------------* | News and views within the Ion Beam Community | *========================================================================* | Authors bear full responsibility for their contributions | *========================================================================* I O N Tuesday, 9 February 1999 Vol. 99 : Num. 002 Heiner Ryssel : IIT 2000 ---------------------------------------------------------------------- From: Heiner Ryssel Date: Mon, 08 Feb 1999 12:33:39 +0100 Subject: Heiner Ryssel : IIT 2000 Enclosed I am sending you some information on the next IIT. FIRST ANNOUNCEMENT GENERAL The 13th International Conference on »Ion Implantation Technology« (IIT 2000) will be held on September 17 to 22, 2000 in Alpbach (Tyrol, Austria) in the scenic Alps. The conference will be preceded by a three-day »Ion Implantation School« from September 14 to 16, 2000. During the conference, an exhibition of ion implantation related equipment takes place. This conference is the thirteenth in a biannual series that began in 1977. The aim of the conference is to stimulate discussions of various aspects of ion implantation processing from ion beam system design to device manufacturing. Both oral and poster sessions are planned. The oral sessions will be arranged in series, and will be introduced with invited, keynote presentations by speakers of international reputation. This gathering of specialists is a unique opportunity to explore a wide range of ion beam related topics in conference sessions. The official language of the conference, English, will be used for all presentations and printed material. CONFERENCE SUBJECTS Process Control (charging, contamination, dose control, beam heating, in situ monitoring, oxide integrity, throughput, etc.) Safety and Environment (SDS, X-rays, etc.) Implanter Systems (low energy, high energy, large-area implantation, vacuum systems, ion optics, new sources, etc.) Ion Solid Interactions (range, damage, channeling, modeling, etc.) Emerging Techniques & Processes (cluster implantation, plasma immersion, etc.) Processing and Devices (sub 0.1 m CMOS, SOI, flat panel displays, etc.) Annealing (RTP, TED, diffusion, etc.) 300 mm Manufacturing CHAIR PERSONS Prof. Jozsef Gyulai (Chair) Dr. Hans Glawischnig (Co-Chair) Prof. Heiner Ryssel (Program Chair) FURTHER INFORMATION Address: IIT 2000 c/o IIS-B Schottkystrasse 10 91058 Erlangen Germany Tel: +49-9131-761-100 Fax: +49-9131-761-102 E-mail: iit2000@iis-b.fhg.de www: http://www.mfa.kfki.hu/IIT2000/ Heiner Ryssel Fraunhofer Institut Integrierte Schaltungen Bereich Bauelementetechnologie Schottkystrasse 10 91058 Erlangen Germany Tel: +49-9131-761-100 Fax: +49-9131-761-102 Mail:ryssel@iis-b.fhg.de ------------------------------ End of I O N V99 #2 ******************* *-----------------------------------------------------------------------* | I O N - part of the IBIS, the Ion Beam Information System | *-----------------------------------------------------------------------* | Editors: | | E. Szilagyi (szilagyi@rmki.kfki.hu) | | G. Battistig (battisti@ra.atki.kfki.hu) | | Z. Hajnal (hajnal@sunserv.kfki.hu) | | | | Contributions to ION: ion@sunserv.kfki.hu | | | | For more info mail to: ion-request@sunserv.kfki.hu | | with a single word in the mail body: INFO | | | | IBIS is now available on-line at http://www.kfki.hu/~ionhp/ | *-----------------------------------------------------------------------*