*========================================================================* | I O N | *------------------------------------------------------------------------* | News and views within the Ion Beam Community | *========================================================================* | Authors bear full responsibility for their contributions | *========================================================================* I O N Friday, 17 April 1998 Vol. 98 : Num. 003 Szilagyi Edit : New version of DEPTH program James Ziegler : Job Position ---------------------------------------------------------------------- From: Szilagyi Edit Date: Thu, 16 Apr 1998 17:01:30 +0200 (MDT) Subject: Szilagyi Edit : New version of DEPTH program Dear colleagues, DEPTH code has now been developed further to calculate the energy and depth resolution of ion beam analysis methods as Rutherford backscattering spectrometry, Elastic recoil detection analysis and Nuclear Reaction Analysis for targets containing multilayers. The reflection and transmission geometries are considered as well. Now it is available to construct and save the simulated energy subspectra as well. The new version of DEPTH can be downloaded from the following site: http://www.kfki.hu/~ionhp/doc/prog/mdepth.htm With best regards, E. Szilagyi ------------------------------ From: James Ziegler Date: Thu, 16 Apr 1998 17:30:55 -0400 Subject: James Ziegler : Job Position =========================================================================== IBM - Research (Yorktown, NY, USA) Position in Material Analysis. Candidates should have extensive experience in material science, with a strong backing in physics, electrical engineering and computers. The position involves material analysis of integrated circuit materials, with emphasis on using Rutherford backscattering (RBS), Elastic recoil detection (ERD), Nuclear reaction analysis (NRA), Proton induced xray emission (PIXE) and Secondary ion mass spectrometry (SIMS). Candidate needs to make presentations to engineering development groups, and have high initiative in developing comprehensive analytic programs to solve difficult problems. It is expected that the employee should rapidly become familiar with modern integrated circuit processing and problems. The position may require frequent travel to IBM development laboratories in Fishkill, NY (25 mi) and Burlington, VT (310 mi). The position involves overseeing wafer processing schedules between cooperating pilot lines. The position involves maintenance of a 3MV ion accelerator, and associated beam lines. Applicants should hold U.S. citizenship, or have a permanent resident visa. ============================================================ Send resumes (hardcopy only) to: James Ziegler MS: 28-024 IBM-Research P.O. Box 218 Yorktown, NY 10598 USA ============================================================ ------------------------------ End of I O N V98 #3 ******************* *-----------------------------------------------------------------------* | I O N - part of the IBIS, the Ion Beam Information System | *-----------------------------------------------------------------------* | Editors: | | E. Szilagyi (szilagyi@rmki.kfki.hu) | | G. Battistig (battisti@ra.atki.kfki.hu) | | Z. Hajnal (hajnal@sunserv.kfki.hu) | | | | Contributions to ION: ion@sunserv.kfki.hu | | | | For more info mail to: ion-request@sunserv.kfki.hu | | with a single word in the mail body: INFO | | | | IBIS is now available on-line at http://www.kfki.hu/~ionhp/ | *-----------------------------------------------------------------------*